主要從事微納光學測量技術與儀器方面的研究工作。在Applied Physics Letters、Optics Express、Journal of Applied Physics、Review of Scientific Instruments等國際著名期刊發表SCI論文20余篇;申請國際國內發明專利10余項,其中授權專利9項。
[1]X. G.Chen, C. W. Zhang, and S. Y. Liu, “Depolarization effects from nanoimprintedgrating structures as measured by Mueller matrix polarimetry,” Applied PhysicsLetters 105(15), 151605, 2013
[2]X. G.Chen, S. Y. Liu, C. W. Zhang, and H. Jiang, “Improved measurement accuracy inoptical scatterometry using correction-based library search,” Applied Optics52(27), 6727-6734, 2013
[3]X. G.Chen, S. Y. Liu, C. W. Zhang, H. Jiang, Z. C. Ma, T. Y. Sun, and Z. M. Xu,“Accurate characterization of nanoimprinted resist patterns using Muellermatrix ellipsometry,” Optics Express 22(12), 15165-15177, 2014
[4]X. G.Chen, C. W. Zhang, S. Y. Liu, H. Jiang, Z. C. Ma, and Z. M. Xu, “Mueller matrixellipsometric detection of profile asymmetry in nanoimprinted gratingstructures,” Journal of Applied Physics 116(19), 194305, 2014
[5]X. G.Chen, S. Y. Liu, H. G. Gu, and C. W. Zhang, “Formulation of error propagationand estimation in grating reconstruction by a dual-rotating compensator Muellermatrix polarimeter,” Thin Solid Films 571, 653-659, 2014
[6]X. G.Chen, H. Jiang, C. W. Zhang, and S. Y. Liu, “Towards understanding thedetection of profile asymmetry from Mueller matrix differential decomposition,”Journal of Applied Physics 118(22), 225308, 2015
[7]X. G.Chen, W. C. Du, K. Yuan, J. Chen, H. Jiang, C. W. Zhang, and S. Y. Liu,“Development of a spectroscopic Mueller matrix imaging ellipsometer fornanostructure metrology,” Review of Scientific Instruments 87(5), 053707, 2016